Thin-film resistor and process for the production thereof

Details Thin-film resistor and process for the production thereof Thin-film resistor and process for the production thereof

1978-05-23

1980-05-27

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

252513, 338308, C23C 1500, H01C 706

Patent

active

042049350

ABSTRACT:
Thin-film resistors with an insulating carrier member and a resistor film applied to the carrier member, in which the resistor film is a chrome-nickel film containing an added amount of at least one of the metals gold, aluminum, cobalt or tin, are disclosed, as well as the process for their production by reactive atomization (sputtering) of the metals in the presence of oxygen.

REFERENCES:
patent: 3400066 (1968-09-01), Caswell et al.
patent: 3477935 (1969-11-01), Hall
patent: 3969278 (1976-07-01), Aksenov et al.
patent: 4021277 (1977-05-01), Shirn
L. T. Maissel et al., "Handbook of Thin Film Technology," McGraw-Hill, N.Y., 1970, pp. 1-78 to 1-80 and 18-8 to 18-12.
E. M. Michalak, "Low Energy Sputtering of Resistive Films," Vacuum, vol. 17 (1967), pp. 317-324.
S. A. Halaby et al., "The Materials of Thin-Film Devices," Electro-Technology, Sep. 1963 pp. 105-107.

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