Method and a system for designing a photomask for use in manufac

Details Method and a system for designing a photomask for use in manufac Method and a system for designing a photomask for use in manufac

1996-03-27

1998-08-18

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, G03F 900

Patent

active

057956839

ABSTRACT:
A method for designing a photomask, used in photolithography using partially coherent incident light, the photomask having a substrate on which a plurality of transparent regions and opaque regions are formed, the transparent regions including a phase shifter for providing the incident light transmitting through the transparent regions with a phase difference, the method comprising the steps of extracting combinations of patterns adjacent to each other within a distance of a threshold value S2 as adjacent pairs from patterns corresponding to the transparent regions, calculating difficulty of correction of the adjacent pairs, sorting the adjacent pairs in an descending order of the difficulty of correction, connecting the patterns in the adjacent pairs to one another, such that a pair of adjacent patterns are not connected to each other and loop cut is performed if a closed loop is formed by connecting the adjacent patterns, and a pair of adjacent patterns are logically connected if a closed loop is not formed by connecting the adjacent patterns, and determining phases of light transmitted through the patterns, so that a phase of one of a pair of patterns is opposite to that of the other, on the basis of an inversion relationship finally obtained by the connecting step.

REFERENCES:
patent: 5538815 (1996-07-01), Oi et al.
patent: 5541025 (1996-07-01), Oi et al.
Symposium on VLSI Technology Digest of Technical Papers, pp. 1060-1061, 1991, Y. Hirai, et al., "Automatic Pattern Generation System for Phase Shifting Mask".
International Electron Devices Meeting, pp. 24.4.1-27.4.4, 1991, Alexander S. Wong, et al., "Investigating Phase-Shifting Mask Layout Issues Using a Cad Toolkit".
Jpn. J. Appl. Phys. vol. 32, No. 12B, pp. 5874-5879, Dec. 1993, Akemi Moniwa, et al., "Algorithm for Phase-Shift Mask Design with Priority on Shifter Placement".

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