Fishing – trapping – and vermin destroying
Patent
1993-03-04
1995-02-07
Hearn, Brian E.
Fishing, trapping, and vermin destroying
437189, 437195, 148DIG12, H01L 21265
Patent
active
053875516
ABSTRACT:
A method of manufacturing a planar inductance element, including the steps of forming a thermal oxide film, a magnetic film, a first insulating interlayer, a planar coil, and a second insulating interlayer on a first semiconductor substrate, forming an insulating film and a magnetic film on a second semiconductor substrate, and adhering the first and the second semiconductor substrates such that the coil side of the first semiconductor substrate faces the magnetic film side of the second semiconductor substrate. According to this method, a stress generated by stacking thin films can be reduced compared with that of a conventional inductance element. Therefore, a high-frequency loss can be reduced, and a quality coefficient Q can be increased.
REFERENCES:
patent: 3614554 (1971-10-01), Shield
patent: 4785345 (1988-11-01), Rawls et al.
patent: 4959631 (1990-09-01), Hasegawa et al.
patent: 5091266 (1992-02-01), Omata
patent: 5095351 (1992-03-01), Andoh et al.
patent: 5102821 (1992-04-01), Moslehi
patent: 5168078 (1992-12-01), Reisman et al.
patent: 5227659 (1993-07-01), Hubbard
patent: 5232870 (1993-08-01), Ito et al.
patent: 5260233 (1993-11-01), Buti et al.
Soohoo, IEEE Transactions on Magnetics, vol. Mag-15, No. 6, Nov. 1979, pp. 1803-1805. "Magnetic Thin Film Inductors for Integrated Circuit Applications".
Kawabe, et al., IEEE Transactions on Magnetics, vol. Mag-20, No. 5, Sep. 1984, pp. 1804-1806. "Planar Inductor".
Fuke Hiromi
Mizoguchi Tetsuhiko
Sato Toshiro
Sawabe Atsuhito
Hearn Brian E.
Kabushiki Kaisha Toshiba
Picardat Kevin M.
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