Method for producing single crystal diamond film

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423446, 117104, 117929, C30B 2904

Patent

active

053873106

ABSTRACT:
A single crystal diamond film having good electrical characteristics is produced by a method which comprises steps of decomposing a raw material gas comprising a hydrogen gas and a carbon-containing compound and epitaxially growing a single crystal diamond film on a single crystal substrate in a vapor phase, wherein a molar ratio of the carbon atoms in the carbon-containing compound to the hydrogen is from 2:100 to 10:100 and a lattice constant of the single crystal substrate satisfies the following relation:

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for producing single crystal diamond film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing single crystal diamond film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing single crystal diamond film will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1108328

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.