Method for fabricating phase inverted mask

Details Method for fabricating phase inverted mask Method for fabricating phase inverted mask

1996-05-31

1998-04-07

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, G03F 900

Patent

active

057362769

ABSTRACT:
A method of fabricating a phase inverted mask comprising the steps of forming a shielding layer pattern on a substrate, injecting oxygen ions into a surface of the shielding layer pattern, and converting the shielding layer pattern having the oxygen ions injected therein into an oxidation layer to thereby form a phase inverted layer.

REFERENCES:
patent: 5208125 (1993-05-01), Lowrey et al.
patent: 5460908 (1995-10-01), Reinberg
Kenji Nakagawa et al., "Mask Pattern Designing for Phase-Shift Lithography", International Electron Devices Meeting, 51, 3.1.1-3.1.4 (1991).

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