Process for forming deposited film

Details Process for forming deposited film Process for forming deposited film

1986-02-20

1988-11-15

Beck, Shrive

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 55, 430128, 430130, 430134, 430136, B05D 306

Patent

active

047848740

ABSTRACT:
A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing carbon and halogen and an active species (B) formed from a chemical substance for film formation which is chemically mutually reactive with said active species (A) separately from each other, then providing them with heat energy and thereby allowing both the species to react chemically with each other to form a deposited film on the substrate.

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patent: 4419381 (1983-12-01), Yamazaki
patent: 4439463 (1984-03-01), Miller
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patent: 4485125 (1984-11-01), Izu
patent: 4514437 (1985-04-01), Nath
patent: 4517223 (1985-05-01), Ovshinsky
patent: 4526805 (1985-07-01), Yoshizawa
patent: 4532199 (1985-07-01), Ueno
patent: 4546008 (1985-10-01), Saitoh

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