Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1993-02-05

1994-11-15

Lerner, Martin

Optical: systems and elements

Polarization without modulation

355 53, 359485, 359489, 359494, 359495, G02B 530, G02B 2728

Patent

active

053653718

ABSTRACT:
A projection exposure apparatus includes a light source, a condenser lens for condensing an illumination light emanating from the light source onto a mask including a circuit pattern, a projection lens for condensing onto a surface of a wafer the illumination light that has passed through the mask, and a polarizer disposed on a surface of a pupil of the projection lens for converting the illumination light converged onto the surface of the wafer into polarized light having radial planes of polarization intersecting the optical axis of the projection lens.

REFERENCES:
patent: 2458437 (1949-01-01), Smith
patent: 2535781 (1950-12-01), Burchell
patent: 2837087 (1958-06-01), Sawyer
patent: 3051054 (1962-08-01), Crandon
patent: 3437401 (1969-04-01), Siksai
patent: 3833289 (1974-09-01), Schuler
patent: 4286843 (1981-09-01), Reytblatt
patent: 5048926 (1991-09-01), Tanimoto
patent: 5153773 (1992-10-01), Muraki et al.
patent: 5245470 (1993-09-01), Keum

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