Alignment and exposure apparatus and method for manufacture of i

Details Alignment and exposure apparatus and method for manufacture of i Alignment and exposure apparatus and method for manufacture of i

1993-03-10

1994-11-15

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

355 53, G01B 1100

Patent

active

053653424

ABSTRACT:
An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.

REFERENCES:
patent: 4153371 (1979-05-01), Koizumi et al.
patent: 4629313 (1986-12-01), Tanimoto

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