Photosensitive compositions containing benzimidazole sensitizers

Details Photosensitive compositions containing benzimidazole sensitizers Photosensitive compositions containing benzimidazole sensitizers

1975-06-26

1976-06-08

Turer, Richard B.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

96115P, 96115R, 20415914, 20415916, 20415918, 20415919, 20415923, 20415924, 260 775CR, 260 783UA, 260 861E, 260 815A, 260304, 260307D, 2603092, 260836, 260837R, 260864, 260865, 260869, 427 54, 526328, 526346, 526343, 526336, 526332, 526330, C08F 246, C08F 400

Patent

active

039620565

ABSTRACT:
The invention relates to photopolymerizable polymeric compositions useful as coating and moldable compositions which are hardenable by ultraviolet radiation. These coating and moldable compositions comprise mixtures of photopolymerizable or photocrosslinkable unsaturated compounds and at least one photoinitiator selected from the group consisting of halo-alkyl benzoxazoles, benzimidazoles and benzothiazoles.

REFERENCES:
patent: 2773822 (1956-12-01), Kern
patent: 3622334 (1971-11-01), Hurley et al.
patent: 3645772 (1972-02-01), Jones
patent: 3912606 (1975-10-01), Pacifici et al.

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