Coating apparatus – Gas or vapor deposition – Running length work
Patent
1993-07-21
1994-11-15
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Running length work
118719, 118723E, 118730, 118733, 136249, C23C 1650, C23C 1654
Patent
active
053644816
ABSTRACT:
The present invention relates to a method and an apparatus for forming photovoltaic conversion layers and electrode layers with increased efficiency by forming thin film layers under optimal conditions on a belt-like flexible substrate which is transported by means two interacting rollers. Films are formed on the substrate, which remains stationary during film-formation, in film-forming chambers maintained airtight by walls pressed against the substrate via sealing materials. Furthermore, film-forming chamber walls and a ground electrode contacting one side of the substrate are retracted from the substrate surface to facilitate movement of the substrate to a next film-forming position without being damaged. The apparatus of the present invention allows not only the film-forming time and conditions, as well as the size, of each film-forming chamber to be controlled independently, but it also prevents intermingling of gases present in different film-forming chambers. In addition, by incorporating a film-forming chamber that can facilitate formation of multi-layered films, or by providing movable film-forming chambers which may be aligned with the substrate, the required time and the size of the apparatus for a device with a multi-layer structure can be shortened.
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Sasaki Toshiaki
Shimizu Hitoshi
Baskin Jonathan D.
Breneman R. Bruce
Fuji Electric & Co., Ltd.
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