Method of and apparatus for detecting pattern defects

Details Method of and apparatus for detecting pattern defects Method of and apparatus for detecting pattern defects

1986-12-10

1989-02-07

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

382 34, G06K 964

Patent

active

048037346

ABSTRACT:
The periphery of an area of a master pattern is expanded by a required number of pixels to define a plurality of master pattern areas two-dimensionally misregistered pixel by pixel, for performing pattern comparison of the respective master pattern areas with an area of an object pattern. The object pattern is deemed defective when all of the comparisons indicate pattern mismatches. The pattern is deemed not defective when at least one comparison indicates a pattern match. Thus, even if an inspected object includes misregistration errors, pattern defects can be detected with high accuracy.

REFERENCES:
patent: 4153897 (1979-05-01), Yasuda et al.
patent: 4614430 (1986-09-01), Hara et al.
patent: 4628531 (1986-12-01), Okamoto et al.
patent: 4641350 (1987-02-01), Bunn
patent: 4648053 (1987-03-01), Fridge
patent: 4677680 (1987-06-01), Harima et al.

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