Silver halide photographic material containing novel chloride co

Details Silver halide photographic material containing novel chloride co Silver halide photographic material containing novel chloride co

1987-06-05

1989-02-07

Shah, Mukund J.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Silver compound sensitizer containing

430505, 430542, 430543, 430554, 430555, 430558, 430569, 430570, G03C 102, G03C 723

Patent

active

048031526

ABSTRACT:
A photogrphic light-sensitive material comparing a support having thereon at least one silver halide emulsion layer, wherein the silver halide emulsion layer comprises a silver chlorobromide emulsion which is substantially free of iodide and has a chloride content which satisfies the following relationship (I) between a mean mole % of silver chloride in grain group (A), in which the grains have sizes not less than the median size in the grain size distribution, and a mean mole % of silver chloride in grain group (B) in which the grains have sizes less than the median size, whereby excellent gradation and wide exposure latitude are achieved, and there is a small dependence on the development conditions.

REFERENCES:
patent: 3935014 (1976-01-01), Klotzer et al.
patent: 3957488 (1976-05-01), Klotzer et al.
patent: 4301242 (1981-11-01), Patzold et al.
patent: 4414306 (1983-11-01), Wey et al.
patent: 4444865 (1984-04-01), Silverman et al.
patent: 4507386 (1985-03-01), Matsuzaka et al.
patent: 4554245 (1985-11-01), Hayashi et al.

Affiliated with

Also associated with

Rating

Silver halide photographic material containing novel chloride co does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silver halide photographic material containing novel chloride co, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silver halide photographic material containing novel chloride co will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1084515