Projection exposure apparatus which determines the minimum numbe

Photocopying – Projection printing and copying cameras – Step and repeat

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Details

355 77, 2504922, 250548, 36446801, G03F 720, H01L 21027

Patent

active

056547927

ABSTRACT:
Disclosed is a projection exposure apparatus for projecting a pattern of an original onto different regions on a substrate sequentially, wherein, on the basis of information related to a chip layout upon the substrate and of at least a chip layout within a projection exposure field and a chip layout within the pattern of the original, a first shot layout with which the number of shots is minimum when the shot layout takes a grid-like form, is determined. Also, on the basis of the information, a second shot layout with which shots are placed in sequence, from an end of the chip layout upon the substrate, without overlap of shots, is determined. The first and second shot layouts are then compared with each other, and one of them which provides a smaller number of shots is selected as a shot layout for the projection exposure operation.

REFERENCES:
patent: 4489241 (1984-12-01), Matsuda et al.
patent: 5194741 (1993-03-01), Sakamoto et al.
patent: 5305222 (1994-04-01), Nakamura
patent: 5337247 (1994-08-01), Hamaguchi

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