Method and system of exposure with a universal dynamic mask and

Details Method and system of exposure with a universal dynamic mask and Method and system of exposure with a universal dynamic mask and

1998-09-17

2000-09-19

Le, Que T.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356400, G01N 2186

Patent

active

061216267

ABSTRACT:
A dynamic mask exposure system and method includes a support for a workpiece, a source of a beam of exposure radiation, and a transmissive dynamic mask with orthogonally arranged matrices of actuator lines and binary pixel units which are opaque or transparent as a function of control inputs to the actuator lines, the transmissive dynamic mask having a top surface and a bottom surface. A control system is connected to supply pixel control signals to the actuator lines of the transmissive dynamic mask to form a pattern of transparent regions and opaque regions. The beam is directed down onto the top surface of the mask. A workpiece and/or an image detection element for detecting a pattern of radiation projected thereon is located on the top surface of the support. The beam passes through the transparent regions and projecting a pattern from the mask onto the support where the workpiece or onto the image detection element is to be located. In the case where the image detection element is the target, there are means for providing signals representing the pattern to the control system.

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Pfauler et al. "High-Throughput Optical Direct Write Lithography" Solid State Technology (Jun. 1997), pp. 175-176, 178, 180, 182.

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