Compound for the aluminum film from chemical vapor depositions a

Details Compound for the aluminum film from chemical vapor depositions a Compound for the aluminum film from chemical vapor depositions a

1999-03-31

2000-09-19

McKane, Joseph

Organic compounds -- part of the class 532-570 series

Organic compounds

Chalcogen in the nitrogen containing substituent

544225, 546 11, 548402, 549 3, 549206, 4271261, 427250, C07D20700, C07D33346, B05D 512

Patent

active

061214434

ABSTRACT:
Organometallic precursor compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organometallic precursor compounds and methods of forming aluminum films.

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patent: 5180687 (1993-01-01), Mikoshiba et al.
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patent: 5330633 (1994-07-01), Matsumoto et al.
patent: 5393699 (1995-02-01), Miksoshiba et al.
Atwood et al., Inorg. Chem. vol. 32, No. 16, pp. 3482-3487, 1993.
"Reactions of Lithium Aluminum Hydride with Representative Elements of the Main Groups of the Periodic System" by Thomas Wartik and H. I. Schlesinger, J. Am. Chem. Soc. vol. 75, pp. 835-839, 1953.

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