Photographic final rinse processing solution and method of use

Details Photographic final rinse processing solution and method of use Photographic final rinse processing solution and method of use

1999-04-06

2000-01-04

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Nonradiation sensitive image processing compositions or...

Wash or aftertreat

G03C 7392

Patent

active

060108347

ABSTRACT:
Color photographic materials are processed using a final rinse solution containing a water-soluble or water-dispersible glycol, and a mixture of specific surfactants. One surfactant is a nonionic polyethoxylated, nonfluorinated compound, or an anionic non-fluorinated sulfate or sulfonate, and the second surfactant is a nonionic or anionic fluorinated compound. This solution provides processed materials, with or without a magnetic backing layer, that are free of scum or other residues, non-tacky, and resistant to abrasion and fingerprinting. The final rinse solution can be provided in concentrated form, particularly because the glycol is included.

REFERENCES:
patent: 3369896 (1968-02-01), Seemann et al.
patent: 3545970 (1970-12-01), Giorgianni et al.
patent: 4537856 (1985-08-01), Kurematsu et al.
patent: 4840877 (1989-06-01), Abe et al.
patent: 5534396 (1996-07-01), McGuckin et al.
patent: 5645980 (1997-07-01), McGuckin et al.
patent: 5667948 (1997-09-01), McGuckin et al.
patent: 5716765 (1998-02-01), McGuckin et al.
patent: 5750322 (1998-05-01), McGuckin et al.

Affiliated with

Also associated with

Rating

Photographic final rinse processing solution and method of use does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photographic final rinse processing solution and method of use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photographic final rinse processing solution and method of use will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1071419