Abrading – Machine – Combined
Patent
1994-12-13
1997-08-05
Eley, Timothy V.
Abrading
Machine
Combined
451288, 451290, 451331, 451456, B24B 704, B24B 2902
Patent
active
056536232
ABSTRACT:
A polishing apparatus for polishing a surface of a workpiece such as a semiconductor wafer is installed in a clean room. The polishing apparatus includes a polishing section having a turntable with an abrasive cloth mounted on an upper surface thereof, a top ring for supporting the workpiece to be polished and pressing the workpiece against the abrasive cloth, a loading section for loading the workpiece to be polished onto the top ring, and an unloading section for unloading the workpiece which has been polished from the top ring. A cover covers an entire area of movement of the top ring including the polishing section, the loading section and the unloading section. An exhaust duct discharges air of an interior space of the cover to an outside of an installation space of the polishing apparatus.
REFERENCES:
patent: 3905273 (1975-09-01), Shook
patent: 4514936 (1985-05-01), Hurtado
patent: 4680893 (1987-07-01), Cronkhite et al.
patent: 4974370 (1990-12-01), Gosis
patent: 5010692 (1991-04-01), Ishida et al.
patent: 5131192 (1992-07-01), Cheng et al.
Aoki Riichirou
Ishikawa Seiji
Kimura Norio
Kodera Masako
Shigeta Atsushi
Ebara Corporation
Eley Timothy V.
Kabushiki Kaisha Toshiba
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