Method of manufacturing heterojunction bipolar transistors

Fishing – trapping – and vermin destroying

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437133, 437909, H01L 21203

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047466260

ABSTRACT:
A heterojunction bipolar transistor having excellent high-frequency characteristics is manufactured by forming a semi-insulating semiconductor layer on a collector (or emitter) layer, removing a part of the semi-insulating semiconductor layer to form a cut portion so that the collector layer is exposed at the cut portion, growing a base layer on the semi-insulating semiconductor layer, on a slant wall of the cut portion and on the exposed part of the collector layer, and growing an emitter (or collector) layer on the base layer. A base layer may be preliminarily formed on the semi-insulating semiconductor layer before forming the cut portion. Energy band gap of the emitter is greater than that of the base.

REFERENCES:
patent: 2569347 (1951-09-01), Shockley
patent: 3413533 (1968-11-01), Kroemer et al.
patent: 3780359 (1973-12-01), Dumke et al.
patent: 4561916 (1984-07-01), Akiyama et al.
patent: 4567060 (1986-01-01), Hayakawa et al.
patent: 4575924 (1986-03-01), Reed et al.
patent: 4593457 (1986-06-01), Birrittella
patent: 4617724 (1986-10-01), Yokoyama et al.
Heterostructure Bipolar Transistors and Integrated Circuits, H. Kroemer, Proceedings of the IEEE, vol. 70, No. 1, pp. 13-25, Jan. 1982.

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