Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1987-09-25
1988-05-24
Pianalto, Bernard D.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 74, B05D 306
Patent
active
047465352
ABSTRACT:
A photosensor comprising a photoconductive layer provided on a substrate. The layer contains amorphous silicon. At least a portion of the layer has a refractive index varying continuously through the thickness of the layer. The refractive index of the layer is 3.2 or less at a wavelength of 6,328 .ANG. in the vicinity of the surface of the substrate. A pair of electrodes are provided in electrical contact with the photoconductive layer. A photoreceptor is also provided, part of which is constituted by the spacing between the electrodes of the pair.
REFERENCES:
patent: 4345021 (1982-08-01), Ogawa et al.
patent: 4390791 (1983-06-01), Hatanaka et al.
patent: 4581099 (1986-04-01), Fukaya et al.
K. Komiya, et al., International Electron Devices Meeting, Washington, D.C. 7th-9th Dec. 1981, pp. 309-312, IEEE, New York, U.S.; "A 2048-Element Contact Type Linear Image Sensor for Facsimile".
Fukaya Masaki
Kamio Masaru
Komatsu Toshiyuki
Sekimura Nobuyuki
Shoji Tatsumi
Canon Kabushiki Kaisha
Pianalto Bernard D.
LandOfFree
Method of making photosensors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of making photosensors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making photosensors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1057624