Method for producing a clean, highly conductive surface for mati

Adhesive bonding and miscellaneous chemical manufacture – Methods – Surface bonding and/or assembly therefor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156245, 156344, 264139, 264344, B32B 3118

Patent

active

047463899

ABSTRACT:
A method is disclosed for providing a clean, highly conductive mating surface in a composite panel which includes an embedded aluminum wire mesh to achieve lightning and electromagnetic interference shielding. The method includes the steps of laying a nonporous tape in a mold corresponding with the area requiring a highly conductive mating surface, laying one or more plies of aluminum mesh thereover to provide a conductive path, and then laying a nonporous barrier tape ply above the mating surface, sandwiching the metal mesh therebetween, with structural plies laid thereover. During curing, the tapes prevent direct resin inclusion into the metal mesh. After curing, the nonporous tape is removed to expose the clean, highly conductive mating surface. Utilizing the above-described method substantially increases the ability to provide a clean conductive mating surface without utilizing extensive equipment or processing steps, providing enhanced EMI shielding in composite structures.

REFERENCES:
patent: 4661186 (1987-04-01), DeBernardi
patent: 4685987 (1987-08-01), Fick
patent: 4707207 (1987-11-01), Baus

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for producing a clean, highly conductive surface for mati does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing a clean, highly conductive surface for mati, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing a clean, highly conductive surface for mati will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1056816

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.