Positive photoresist containing 1,2-naphthoquinone-diazide-5-sul

Details Positive photoresist containing 1,2-naphthoquinone-diazide-5-sul Positive photoresist containing 1,2-naphthoquinone-diazide-5-sul

1991-10-02

1993-06-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, 430512, G03F 7023, G03C 161

Patent

active

052197018

ABSTRACT:
Structures of high resolution in the near UV range and of high sharpness of edge and steepness of edge can be obtained by means of positive photoresists containing, in an organic solvent, in each case essentially at least

REFERENCES:
patent: 3130047 (1964-04-01), Uhlig et al.
patent: 4587196 (1986-05-01), Toukhy
patent: 4594306 (1986-06-01), Stahlhofen et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4738915 (1988-04-01), Komine et al.
patent: 5077173 (1991-12-01), Schulz et al.
Derwent Abst. 89-033252/05 (EP 301332).

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