Photosensitive polymer having thiol group

Details Photosensitive polymer having thiol group Photosensitive polymer having thiol group

1989-06-02

1991-06-25

Kight, III, John

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525421, 525426, 525436, C08F28304, C08L 7706

Patent

active

050267884

ABSTRACT:
Disclosed are a novel photosensitive poly(amide)imide precursor capable of being manufactured easily, having excellent shelf stability and high sensitivity, and containing less impurities, a process for manufacturing the above-mentioned precursor, a photosensitive polymer composition containing the precursor, and a process for forming a patterned poly(amide)imide film by the use of the photosensitive polymer composition.
The photosensitive polymer has an inherent viscosity of 0.1 to 5 dl/g and contains a repeating unit represented by the following general formula (I), ##STR1## wherein R.sup.1 is a trivalent or tetravalent carbon cyclic aromatic group or hetrocyclic group; R.sup.2 is an aliphatic group having at least 2 carbon atoms, an alicyclic group, an aromatic aliphatic group, a carbon cyclic aromatic group, a heterocyclic group or a polysiloxane group; R.sup.3 is a divalent organic group; R.sup.4 is --R.sup.3 --SH, a hydrogen atom or a monovalent organic group; m is independently 1 or 2; n is independently 0 or 1; and m and n satisfy 1.ltoreq.m+n.ltoreq.2.

REFERENCES:
patent: 4645823 (1987-02-01), Ai et al.
patent: 4694061 (1987-09-01), Pfeifer

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