Process for forming pattern films

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427431, 427 44, 427 82, 427227, 427249, 427250, 4272556, 437225, B05D 306

Patent

active

050716719

ABSTRACT:
A focused ion beam is irradiated on a predetermined area of a substrate on which a film is to be formed, and a vapor stream of film-forming depositable material is directed onto a localized area of the substrate which is being irradiated with the focused ion beam to convert the film-forming material to a film deposit on the predetermined area of the substrate. The process can be used to repair white-spot defects in masks and to otherwise deposit films having sharply defined edges and widths in the submicron range.

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