Coproduction of a normal purity and ultra high purity volatile c

Refrigeration – Processes – Circulating external gas

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

62 24, 62 39, F25J 300

Patent

active

052188256

ABSTRACT:
This invention relates to an improved process for the coproduction of a volatile component with normal purity and ultra high purity from a stream containing other heavier components and contaminated with lighter impurities which are more volatile than the volatile component. The improvement resides in removing a stream of the volatile component which is substantially free of the lighter impurities and then introducing the stream stripped of impurities to a second distillation column for fractionation. The second distillation column is equipped with a rectification section wherein the stream is rectified and the volatile component obtained in ultra high purity as an overhead. The volatile component with normal purity is obtained from the first distillation column as an overhead.

REFERENCES:
patent: 4615716 (1986-10-01), Cormier et al.
patent: 4662918 (1987-05-01), Agrawal
patent: 4783210 (1988-11-01), Ayres et al.
patent: 4871382 (1989-10-01), Thorogood et al.
patent: 4895583 (1990-01-01), Flanagan et al.
patent: 4902321 (1990-02-01), Cheung
patent: 4957523 (1990-09-01), Zarate et al.
patent: 5049173 (1991-09-01), Cormier et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Coproduction of a normal purity and ultra high purity volatile c does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Coproduction of a normal purity and ultra high purity volatile c, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coproduction of a normal purity and ultra high purity volatile c will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1035662

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.