Method and apparatus for making charged particle beam exposure

Details Method and apparatus for making charged particle beam exposure Method and apparatus for making charged particle beam exposure

1992-03-19

1993-01-19

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37302

Patent

active

051809206

ABSTRACT:
A charged particle beam exposure method is used to expose an exposure region of a substrate which is placed on a movable stage by irradiating a charged particle beam on the exposure region of the substrate. The method includes the steps of (a) dividing the exposure region into a plurality of band-shaped regions, (b) deflecting the charged particle beam within a drawing range from one side to the other side of each band-shaped region in a longitudinal direction of the band-shaped region while continuously moving the stage in a stage moving direction, where the drawing range is a range in which the charged particle beam can be deflected, (c) monitoring a deflection position of the charged particle beam on the substrate along the stage moving direction, and (d) varying a moving speed of the stage depending on the deflection position relative to one or a plurality of reference positions located along the stage moving direction within the drawing range.

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