Devices having asymmetric delta-doping

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357 19, 357 16, 357 4, 357 57, H01L 2714, H01L 3112, H01L 2966, H01L 2712

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active

049740440

ABSTRACT:
The use of alternating n and p type regions asymmetrically spaced in a semiconductor material yields extremely advantageous properties. In particular, by controlling the doping level and the spatial configuration of the doped region both the device response and its optical properties are controllable. Therefore, in applications such as those involving optical switches LEDs, lasers and long wavelength detectors, both the speed of device and its optical properties are controllable. As a result, greater fabrication flexibility than previously available is possible.

REFERENCES:
patent: 3626328 (1971-12-01), Esaki
patent: 4665412 (1987-05-01), Ohkawa
patent: 4694318 (1987-09-01), Capasso et al.
patent: 4772335 (1988-09-01), Huang
patent: 4794611 (1988-12-01), Hara et al.
The Physics of Semiconductor Devices, 2nd Edition, S. M. Sze, Chapter 1, John Wiley & Sons, New York, 1981.
Advanced Crystal Growth, P. M. Dryburgh, B. Cockayne, K. G. Barraclough, eds, Prentice Hall, London, 1987, Part IV.

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