Method for maskless chemical and electrochemical machining

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

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2041296, 20412955, B23P 100, C25F 302

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active

042832594

ABSTRACT:
A method for high resolution maskless chemical and electrochemical machining is described. Preferential etching results from exposing those regions where machining is sought to an energy beam. Such exposures can increase the ething rate in the case of electrochemical machining by a factor of 10.sup.3 to 10.sup.4. Such enhancement is sufficient to make masking unnecessary.

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