Fluid handling – Processes – Affecting flow by the addition of material or energy
Patent
1990-07-18
1991-10-22
Chambers, A. Michael
Fluid handling
Processes
Affecting flow by the addition of material or energy
156643, 137334, C23F 100
Patent
active
050586165
ABSTRACT:
This invention relates to a method of and a system for supplying ultrahigh purity gas to a process device operated under reduced pressure. The first invention is a method of supplying ultrahigh purity gas comprising the steps of heating, in non-operation of the process device for effecting film making or etching under reduced pressure, a pipe line for supplying ultrahigh purity gas into said device at least for a prescribed period of time for the purpose of exhausting the ultrahigh purity gas from said pipe line, and stopping said heating of said pipe line in operation of said device and supplying the ultrahigh purity gas from said pipe line into said device via an introduction inlet of said device. The second invention is a system for supplying ultrahigh purity gas including a piping system composed of a pipe line communicating between a gas introduction inlet of the device serving to effect film making or etching under reduced pressure and a source of ultrahigh purity gas, a mechanism provided frontally of the gas introduction inlet of said device for exhausting foreign gases existent in the piping system to the outside thereof, and a mechanism for heating at least part of said pipe line extending to said gas introduction inlet.
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