Apparatus for heating semiconductor wafers in order to achieve a

Details Apparatus for heating semiconductor wafers in order to achieve a Apparatus for heating semiconductor wafers in order to achieve a

1985-02-07

1987-03-10

Goldberg, E. A.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219405, 219411, 118 501, 118724, F27B 514, F27D 1102

Patent

active

046492615

ABSTRACT:
An integrating light pipe, very preferably a kaleidoscope, encloses a source of radiant thermal energy, the light pipe and energy source being so arranged as to achieve efficient and substantially uniform heating of a workpiece in a target plane. The pipe has closed ends so as to heat the workpiece from both sides uniformly and efficiently. The apparatus employs CW lamps, pulsed lamps, and a combination of the two.

REFERENCES:
patent: 3047438 (1962-07-01), Marinace
patent: 3160517 (1964-12-01), Jenkin
patent: 3240915 (1966-03-01), Carter et al.
patent: 3460510 (1969-08-01), Currin
patent: 3502516 (1970-03-01), Henker
patent: 3623712 (1971-11-01), McNeilly et al.
patent: 3627590 (1971-12-01), Mammel
patent: 3661637 (1972-05-01), Sirtl
patent: 3692572 (1972-09-01), Strehlow
patent: 3836751 (1974-09-01), Anderson
patent: 4097226 (1978-06-01), Erikson
patent: 4101759 (1978-07-01), Anthony
patent: 4493977 (1985-01-01), Arai
patent: 4533820 (1985-08-01), Shimizu
patent: 4540876 (1985-09-01), McGinty
patent: 4550245 (1985-10-01), Arai
patent: 4567352 (1986-01-01), Mimura
"The Use of a Kaleidoscope" . . . , Applied Optics, vol. 2, No. 3, Mar. 1963, pp. 265-271.
Appl. Phys. Lett. 30(2), 15 Jul., 1981, Powell et al, pp. 150-152.
Appl. Phys. Lett. 33(11), pp. 955-957, 1 Dec., 1978, Bomke et al.
Appl. Phys. Lett. 33(8), pp. 751-753, 15 Oct., 1978, Cohen et al.
"Rapid Large Area Annealing of Ion-Implanted Si, etc.", Lischner et al, pp. 759-764.
"Transient Heating with Graphite Heaters for Semiconductor Processing", Fan et al, pp. 751-758.
"Ion Implantation & Rapid Annealing of 125 mm Wafers", Current et al, Solid State Technology, Oct. 1983, pp. 197-202.

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