Liquid distribution system for chemical engineering apparatuses

Fluid handling – Systems

Patent

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210519, F15D 114

Patent

active

045614610

ABSTRACT:
A liquid distribution system for chemical engineering apparatuses comprises a liquid dividing means and an apertured distribution plate disposed below the liquid dividing means. The peripheries of the apertures in the plate are raised with respect to the surface of the plate.
The liquid dividing means may comprise elements such that the liquid flows along an inclined wall to the periphery of the apertured plate and the peripheries of the holes of the plate are raised with respect to its surface, e.g. by using tubes or bar members above the surface or grooves in the surface. The raised portions are provided with grooves or apertures.
This system is particularly suitable for absorbers of falling film, block or tube type, and for filled columns.

REFERENCES:
patent: 2193696 (1940-03-01), Ramsaur
patent: 2903166 (1959-09-01), Kuljian
patent: 3206396 (1965-09-01), Davis
patent: 3384114 (1968-05-01), Hathaway et al.
patent: 3391703 (1968-07-01), Kay
patent: 3826376 (1974-07-01), Carlson et al.
patent: 4085040 (1978-04-01), Egan
patent: 4179381 (1979-12-01), Baur
patent: 4182376 (1980-01-01), Nilsson
patent: 4230575 (1980-10-01), Lizee
patent: 4302338 (1981-11-01), Pfohl et al.
patent: 4339332 (1982-07-01), Jasperson

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