Laser etch monitoring system

Details Laser etch monitoring system Laser etch monitoring system

1985-01-14

1986-09-09

LaRoche, Eugene R.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

350501, 350172, H01J 314, G02B 2300

Patent

active

046111158

ABSTRACT:
An optical system transmits and reflects a laser beam along a common optical path between a laser generator and the target area on a workpiece. Illuminating light is transmitted along a portion of the optical path to the workpiece and is reflected therefrom to form an image of the target area projected onto a display screen. The reflected laser beam is focused at a detection point to monitor etch rate while the illuminating light is reflected adjacent thereto from the optical path to provide a visual indication of the laser beam locations on the workpiece corresponding to the image being simultaneously displayed.

REFERENCES:
patent: 4560866 (1985-12-01), Takenouchi et al.

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