Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-06-04
1991-11-12
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, 430270, 430340, 430343, 430344, 430920, G03C 152, G03C 500
Patent
active
050647415
ABSTRACT:
A light-sensitive composition is herein disclosed, which comprises at least one free radical generator represented by the following general formula: ##STR1## and at least one discoloring agent which interacts with products generated through the photolytic degradation of the free radical generator to change the color tone of the composition. The composition has a high stability with time and a good printing out property and therefore it can be used in making light-sensitive layer of PS plates, photoresists, proof plates for printing and films for overhead projector, intermediate print and photomask having high sensitivity long shelf life.
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Abe Yukio
Kawamura Koichi
Koike Akinobu
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
Young Christopher G.
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