Pattern exposure/transfer method and pattern exposure/transfer m

Details Pattern exposure/transfer method and pattern exposure/transfer m Pattern exposure/transfer method and pattern exposure/transfer m

1989-12-26

1991-09-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Liquid crystal process, composition, or product

355 53, 428 1, 430311, 430 5, 359 40, 359 54, G03C 506, G03B 2732

Patent

active

050454196

ABSTRACT:
According to a pattern exposure/transfer method disclosed in the present invention, an optical modulating mask whose optical contrast can be changed by electrical control is used and an optical pattern image of the optical modulating mask is exposed/transferred to an object to be exposed. The present invention also discloses a pattern exposure/transfer mask apparatus whose optical contrast can be changed by electrical control. According to the pattern exposure/transfer method of the present invention, an arbitrary pattern image can be easily formed by the optical modulating mask. The pattern exposure/transfer mask apparatus of the present invention is able to change optical contrast by electrical control, and allows easy formation of an arbitrary pattern image.

REFERENCES:
patent: 4297022 (1981-02-01), Lester
patent: 4297022 (1981-10-01), Lester
patent: 4727380 (1988-02-01), Miura et al.
patent: 4805002 (1989-02-01), Sasago et al.

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