Organic compounds -- part of the class 532-570 series – Organic compounds – Amino nitrogen containing
Patent
1996-10-28
1997-10-21
O'Sullivan, Peter
Organic compounds -- part of the class 532-570 series
Organic compounds
Amino nitrogen containing
564461, C07C20932, C07C20948
Patent
active
056798601
ABSTRACT:
A process for producing 3-aminomethyl-3,5,5-trimethylcyclohexyl amine (isophorone diamine) from isophorone nitrile. Isophorone nitrile is iminated in a first stage and then the reaction mixture is subjected to aminating hydrogenation in a second stage in the presence of a fixed bed hydrogenation catalyst based on Raney cobalt. The fixed bed hydrogenation catalyst is produced in a special manner by mixing a powdery Co--containing Raney alloy with powdery cobalt, sintering the powdery mixture to shaped moldings and then activating by leaching with alkali hydroxide solution. The yield and/or space-time yield in isophorone diamine production can be increased.
REFERENCES:
patent: 3352913 (1967-11-01), Schmitt et al.
patent: 3558365 (1971-01-01), Duddy
patent: 3781227 (1973-12-01), Sokolsky et al.
patent: 4826799 (1989-05-01), Cheng et al.
patent: 5091554 (1992-02-01), Huthmacher et al.
patent: 5504254 (1996-04-01), Haas et al.
patent: 5536694 (1996-07-01), Schuetz et al.
JP Patent Appln. Disclosure 7-188126--Jul. 25, 1995.
JP Patent Appln. Disclosure 6-321870--Nov. 22, 1994.
JP Patent Appln. Disclosure 99 987/75--Aug. 8, 1975.
Arntz Dietrich
Berweiler Monika
Burmeister Roland
Haas Thomas
Weber Karl-Ludwig
Degussa - Aktiengesellschaft
O'Sullivan Peter
LandOfFree
Process for the production of 3-aminoethyl-3,5,5-trimethylcycloh does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the production of 3-aminoethyl-3,5,5-trimethylcycloh, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of 3-aminoethyl-3,5,5-trimethylcycloh will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1008186