Mask pattern for alignment

Details Mask pattern for alignment Mask pattern for alignment

1997-08-28

2000-09-12

Lee, Eddie C.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, G03B 2742, G03B 2754

Patent

active

061185175

ABSTRACT:
A reticle mask is provided which allows a determination of an offset amount of a circuit pattern on a mask with respect to reticle alignment marks based on the offset between the reticle alignment marks and position measurement patterns. The position measurement patterns are formed in the circuit pattern area surrounded by a light shielding area, and enables a determination of the offset amount of the circuit pattern with respect to the reticle alignment marks, thereby reducing an offset amount between overlaid circuit patterns.

REFERENCES:
patent: 4269505 (1981-05-01), Mayer
patent: 4768883 (1988-09-01), Waldo et al.
patent: 5331371 (1994-07-01), Mori et al.
patent: 5524131 (1996-06-01), Uzawa et al.
patent: 5601957 (1997-02-01), Mizutani et al.
patent: 5640243 (1997-06-01), Koitabashi et al.
patent: 5691115 (1997-11-01), Okamoto et al.
patent: 5715063 (1998-02-01), Ota
patent: 5795687 (1998-08-01), Yasuda
patent: 5995199 (1999-11-01), Shinozaki et al.
United Kingdom Search Report dated Nov. 17, 1997.

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