Gas plasma treated porous medium and method of separation using

Liquid purification or separation – Processes – Separating

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95241, 95273, 210188, 210503, 210508, 210649, 427243, 427244, 427535, 427536, 427538, 427539, B01D 3700, B01D 3702, B01D 4600, B05D 304

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active

056792646

ABSTRACT:
A gas plasma treated porous medium and method of using such a medium to separate or remove materials such as components of biological fluids.

REFERENCES:
patent: 3065157 (1962-11-01), Busse
patent: 3107206 (1963-10-01), Cottet et al.
patent: 3188165 (1965-06-01), Magat et al.
patent: 3383163 (1968-05-01), Menashi
patent: 3870610 (1975-03-01), Baird et al.
patent: 4072769 (1978-02-01), Lidel
patent: 4107049 (1978-08-01), Sano et al.
patent: 4188426 (1980-02-01), Auerbach
patent: 4214014 (1980-07-01), Hofer et al.
patent: 4261806 (1981-04-01), Asai et al.
patent: 4411866 (1983-10-01), Kanno
patent: 4445991 (1984-05-01), Arbit
patent: 4483694 (1984-11-01), Takamura et al.
patent: 4488954 (1984-12-01), Hatada et al.
patent: 4503133 (1985-03-01), Van Lier et al.
patent: 4504349 (1985-03-01), Ueno et al.
patent: 4508781 (1985-04-01), Yagi et al.
patent: 4548867 (1985-10-01), Ueno et al.
patent: 4572724 (1986-02-01), Rosenberg et al.
patent: 4606930 (1986-08-01), Ueno et al.
patent: 4613517 (1986-09-01), Williams et al.
patent: 4656083 (1987-04-01), Hoffman et al.
patent: 4686149 (1987-08-01), Aonuma et al.
patent: 4824444 (1989-04-01), Nomura
patent: 4845132 (1989-07-01), Masuoka et al.
patent: 4861617 (1989-08-01), Pall et al.
patent: 4880548 (1989-11-01), Pall et al.
patent: 4933092 (1990-06-01), Aunet et al.
patent: 4948628 (1990-08-01), Montgomery et al.
patent: 4954256 (1990-09-01), Degen et al.
patent: 5028332 (1991-07-01), Ohnishi
patent: 5041304 (1991-08-01), Kusano et al.
patent: 5112690 (1992-05-01), Cohen et al.
patent: 5198263 (1993-03-01), Stafford et al.
patent: 5217627 (1993-06-01), Pall et al.
patent: 5232600 (1993-08-01), Degen et al.
patent: 5234723 (1993-08-01), Babacz
patent: 5258127 (1993-11-01), Gsell et al.
patent: 5282965 (1994-02-01), Urairi et al.
patent: 5409696 (1995-04-01), Narayanan et al.
patent: 5437900 (1995-08-01), Kuzowski
patent: 5443743 (1995-08-01), Gsell
patent: 5451321 (1995-09-01), Matkovich
d'Agostino, Riccardo, "Plasma Deposition, Treatment, & Etching of Polymers", Plasma--Materials Interactions, 1990, pp. 463-516.

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