System and methods for optically measuring dielectric thickness

Optics: measuring and testing – By light interference – For dimensional measurement

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

G01B 902

Patent

active

061668192

ABSTRACT:
A method for optically measuring layer thickness in accordance with the present invention includes the steps of providing a first metal layer on a semiconductor device structure, providing a second metal layer on the first metal layer, forming a dielectric layer over the second metal layer and directing light onto the structure such that light reflected from a surface of the dielectric layer and a surface of the second metal layer create an interference pattern from which the dielectric layer thickness is measured. A system for optically measuring layer thickness includes a semiconductor device to be measured. The semiconductor device includes a first metal layer, a second metal layer disposed on the first metal layer, the second metal layer having an arcuate shaped top surface and a dielectric layer disposed on the second metal layer. A means for directing and receiving light is also included wherein light is directed onto the semiconductor device such that light reflected from a surface of the dielectric layer and a surface of the second metal layer creates an interference pattern from which the dielectric layer thickness is measured.

REFERENCES:
patent: 4984894 (1991-01-01), Kondo
patent: 5473431 (1995-12-01), Hollars et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System and methods for optically measuring dielectric thickness does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and methods for optically measuring dielectric thickness , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and methods for optically measuring dielectric thickness will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1001220

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.