Optics: measuring and testing – By polarized light examination – With light attenuation
Patent
1997-12-04
2000-12-26
Pham, Hoa Q.
Optics: measuring and testing
By polarized light examination
With light attenuation
3562374, 3562391, 250548, G01B 1114, G01N 2100
Patent
active
061668087
ABSTRACT:
A height meter for measuring the height of a first surface of a transparent object is described, which height meter comprises a radiation source for supplying a converging measuring beam whose chief ray extends at an angle to the normal on the surface, and a radiation-sensitive detection unit for detecting a radiation beam reflected by the surface to be measured. Since a diaphragm is arranged in the path of this beam, it is prevented that radiation reflected by a second surface situated opposite the first surface can reach the detection unit. The height meter is notably suitable for an inspection device for a lithographic mask.
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patent: 3857637 (1974-12-01), Obenreder
patent: 4477185 (1984-10-01), Berger et al.
patent: 4558949 (1985-12-01), Uehara et al.
patent: 5298974 (1994-03-01), Chandley
patent: 5381225 (1995-01-01), Kohno
patent: 5510892 (1996-04-01), Mizutani et al.
patent: 5737074 (1998-04-01), Haga et al.
Pham Hoa Q.
U.S. Philips Corporation
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