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- Inventors
- Etching a substrate: processes
- Masking of a substrate using material resistant to an etchant
- Mask resist contains organic compound
Details
Yang Chan-Lon
Yang
Chan-Lon
- Patent Class
Etching a substrate: processes
- SubClass
Masking of a substrate using material resistant to an etchant
- SubSubClass
Mask resist contains organic compound
- Specialty
Inventor
- Status
active
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Profile ID: LFUS-PAI-P-2478468
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