4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Wade Zawalski

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Method for providing pulsed plasma during a portion of a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Plasma assisted processing chamber with separate control of...

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Plasma energy control by inducing plasma instability

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2480633

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