4. Gas separation
  5. With nonliquid cleaning means for separating media
  6. Solid agent cleaning member movingly contacts apparatus

Tooru Sumiya

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Chemical vapor deposition of tungsten silicide using silicon sub

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
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Device for trapping gaseous compounds of refractory metals and p

Gas separation – With nonliquid cleaning means for separating media – Solid agent cleaning member movingly contacts apparatus
Patent

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Profile ID: LFUS-PAI-P-1713362

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