4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Takuya Matsui

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Apparatus and method for plasma processing

Coating apparatus – Gas or vapor deposition – Work support
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Fused bicyclic nitrogen-containing heterocycles

Drug – bio-affecting and body treating compositions – Designated organic active ingredient containing – Heterocyclic carbon compounds containing a hetero ring...
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Method of detecting nucleic acid by using DNA microarrays...

Chemistry: molecular biology and microbiology – Measuring or testing process involving enzymes or... – Involving nucleic acid
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Plasma processing method and apparatus

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
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Plasma processing method and apparatus

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Profile ID: LFUS-PAI-P-2467838

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