4. Image analysis
  5. Applications
  6. Manufacturing or product inspection

Taketoshi Omata

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Method of manufacturing mask using independent pattern data...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Pattern data processing system, pattern data processing...

Image analysis – Applications – Manufacturing or product inspection
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Wavelength-independent exposure pattern generation method...

Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
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Profile ID: LFUS-PAI-P-2239576

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