4. Data processing: artificial intelligence
  5. Neural network
  6. Structure

Ryu Kaiwara

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Plasma device

Coating apparatus – Gas or vapor deposition – With treating means
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Plasma method with high input power

Electric heating – Metal heating – By arc
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Plasma process apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
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Semiconductor arithmetic circuit

Data processing: artificial intelligence – Neural network – Structure
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Profile ID: LFUS-PAI-P-2446453

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