4. Electric lamp and discharge devices: systems
  5. Discharge device load with fluent material supply to the...
  6. Plasma generating

Robert Wallace

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Active species control with time-modulated plasma

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

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Gas distribution plate electrode for a plasma reactor

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
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Method and apparatus for improving processing and reducing...

Coating apparatus – Gas or vapor deposition – With treating means
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Plasma reactor having an inductive antenna coupling power...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
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Plasma reactor having RF power applicator and a dual-purpose...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
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Profile ID: LFUS-PAI-P-2064653

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