4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Robert B. Majewski

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Apparatus and method for depositing low K dielectric materials

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Toroidal plasma source for plasma processing

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Toroidal plasma source for plasma processing

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2080464

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