4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Pete Sgarbossa, Esq.

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Inductively coupled high density plasma reactor for plasma assis

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Plasma reactor with a segmented balanced electrode for sputterin

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Profile ID: LFUS-PAI-P-1337010

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