4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Pei Hung Chen

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Method to reduce contact resistance by means of in-situ ICP

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Plasma etch method for forming patterned layer with enhanced...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1286440

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