4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Michaelson and Wallace

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Center gas feed apparatus for a high density plasma reactor

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
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Correction of wafer temperature drift in a plasma reactor...

Electric heating – Heating devices – With power supply and voltage or current regulation or...
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Externally excited torroidal plasma source

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
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Externally excited torroidal plasma source using a gas...

Coating apparatus – Gas or vapor deposition – With treating means
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High pressure high non-reactive diluent gas content high...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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