4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Mervyn H. Davis

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Filamentless ion source for thin film processing and surface mod

Electric lamp and discharge devices – With positive or negative ion acceleration
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Plasma processing apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Profile ID: LFUS-PAI-P-812442

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